simulator
modeling and simulation of photo-lithography
Embedded Files
Notes
Notes
Video demonstration of the main features of vmCompLith
part_1 of 07-31-2021 04_46_16 PM.mp41. Getting started. Loading a mask, simulation, changing and rendering of contours of constant intensity ( threshold )
part_2 of 07-31-2021 04_54_36 PM.mp42. Model parameters (characteristics of stepper, light source, mask transparency). Changing parameters, affecting the mask image.
part_3 of 07-31-2021 04_56_36 PM.mp43. Analysis of the image: one-dimensional sections of the two-dimensional function (intensity) along the specified segments on the mask ( cutlines ).
part_4 of 07-31-2021 05_02_21 PM.mp44. Image analysis: histogram of deviations of contours of constant intensity (threshold) from the mask (edges of polygons), standard deviation etc .. When selecting the histogram element (clicking a bar) the respective deviations are highlighted on the mask image in the main window (back-annotation)
part_5 of 07-31-2021 05_50_37 PM.mp45. Optimization of the mask ( OPC ). Selection of parameters, start of simulation-correction iterations. Automatic update of the mask image and histogram of contour deviations after each iteration.
A bit of history (about)
I am lucky: from 1987 until my retirement, I was engaged in one, exciting and interesting thing for me - modeling of lithography technology. In 2008, to test some ideas, I developed an original optical lithography simulator. The main tasks were: optimization of the performance and the accuracy of calculations. The problem of modeling of masks elements of arbitrary shape ( all-angle mask ) was also considered. Few approaches and metrices for analyzing the mask image as well as selected numerical characteristics of the image quality were evaluated. Results of this work with accumulated data from test simulations were presented at the SPIE Conference of Optical Microlithography in 2009. / Manuylov, Vadim. Advanced Model and Fast Algorithm for Aerial Image Computation with Well Controlled Accuracy. Proceedings of the SPIE, Volume 7274, p. 727431(2009) /
This simulator was then extended with mask optimization ( OPC ) capabilities and provided with a graphical interface.
I have used it successfully in interviews at Luminiscent, Global Foundries, Cadence, Mentor Graphics, and Brion-ASML. The presentation of the simulator made the interview more interesting - put it into a discussion mode.
I recently found my simulator in archives and decided to restore / update and make it available to those who are interested in it. The vmCompLith source code can be downloaded (link below).
To build, you need Qt 5.12 or Qt 6.2 and C++ .
Of course, modern EUV- based technology is much more complex, new modeling tools allow much more subtle effects to be studied ...
However, perhaps vmCompLith will be useful for (self-) education and/or to illustrate the main effects, problems and approaches in lithography, etc.
Version of August 14, 2021
Fixes / Changes:
move the simulating area holding Alt + left-mouse-button
saving the mask (set of polygons) and its image (2-dimensional distribution of light intensity) to text files: File-> Save layout ... / File-> Save image as text ...
cosmetic changes
__________________
zip archive includes source code (vmCompLith folder) and 2 cif-files with test masks.
A description of the main controls of the application can be found clicking the Help-> How to ... menu item.
Source code
Source code
Examples / Pictures
Examples / Pictures
Simulation of the mask image.
Parameters and image quality analysis.
Deviation of the image threshold from the mask.
Image simulation and mask correction / optimization (Optical Proximity Correction).
Image quality analysis.
Example of 1D intensity distribution (image cross-section along a cutline).
Page updated
Google Sites
Report abuse